Metrology of Wide-Viewing-Angle /4 Plate in lithography

DOI

10.2991/iwmecs-15.2015.147How to use a DOI?

Keywords

Metrology; waveplate; wide viewing angle; phase; retardation; oblique incidence

Abstract

Waveplates are among the most commonly used devices for altering the polarization state of light, and have been widely applied in polarization analysis of high-numerical-aperture (high-NA) imaging systems such as polarizing microscopes and immersion lithographers. As the NA of an optical system is increased, the effects of oblique incidence on the phase retardation of light rays passing through a waveplate become increasingly significant. This paper describes the design and manufacture of a 632.8 nm wide-viewing-angle (WVA) /4 plate. The method of phase compensation is employed to measure the phase retardation characteristics of this waveplate. These experimental results show that the phase retardation by the WVA /4 plate is consistently in the range between 84°and 96° for angles of incidence between ±20°, which confirms the effectiveness of the combination of positive and negative crystal in eliminating the influence of oblique incidence on phase retardation.

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Juan Dong
AU  - Peng Du
PY  - 2015/10
DA  - 2015/10
TI  - Metrology of Wide-Viewing-Angle /4 Plate in lithography
BT  - Proceedings of the 2015 2nd International Workshop on Materials Engineering and Computer Sciences
PB  - Atlantis Press
SP  - 739
EP  - 745
SN  - 2352-538X
UR  - https://doi.org/10.2991/iwmecs-15.2015.147
DO  - 10.2991/iwmecs-15.2015.147
ID  - Dong2015/10
ER  -