Electron Mobility Degradation Due to Remote Coulomb Scattering in Ge MOSFET
Haoyu Xu, Jing Zhang, Shuhua Wei, Xiaolei Wang, Wenwu Wang
Available Online August 2016.
- https://doi.org/10.2991/cset-16.2016.72How to use a DOI?
- Ge, mobility, remote coulomb scatterings
- Remote Coulomb scatterings (RCS) on electron mobility degradation are experimentally investigated in Ge based metal-oxide-semiconductor field-effect-transistor (MOSFETs) with GeOx/Al2O3 gate stacks. The mobility is found increased with thicker GeOx (7.8-20.8 ). The physical origin of this mobility dependence on GeOx thickness is explored. The following factors are excluded: Coulomb scattering due to interfacial traps at GeOx/Ge, phonon scattering, and surface roughness scattering. Therefore, the RCS from charges in gate stacks are studied. The charge distributions in GeOx/Al2O3 gate stacks are experimentally evaluated. The bulk charges in Al2O3 and GeOx are found negligible. The density of interfacial charge is +3.2ž1012 cm-2 at GeOx/Ge interface, and -2.3ž1012 cm-2 at Al2O3/GeOx interface. The electric dipole at Al2O3/GeOx interface is found +0.15 V, corresponding to areal charge density of 1.9ž1013 cm-2. The origin of this mobility dependence on GeOx thickness is attributed to the RCS due to electric dipole at Al2O3/GeOx interface. And this remote dipole scattering is found to play a significant role on mobility degradation. The discovery of this new scattering mechanism indicates that engineering of Al2O3/GeOx interface is key for mobility enhancement and device performance improvement. These results are helpful for understanding and engineering the Ge mobility enhancement.
- Open Access
- This is an open access article distributed under the CC BY-NC license.
Cite this article
TY - CONF AU - Haoyu Xu AU - Jing Zhang AU - Shuhua Wei AU - Xiaolei Wang AU - Wenwu Wang PY - 2016/08 DA - 2016/08 TI - Electron Mobility Degradation Due to Remote Coulomb Scattering in Ge MOSFET BT - 2016 International Conference on Computer Science and Electronic Technology PB - Atlantis Press SP - 310 EP - 313 SN - 2352-538X UR - https://doi.org/10.2991/cset-16.2016.72 DO - https://doi.org/10.2991/cset-16.2016.72 ID - Xu2016/08 ER -