Proceedings of the 2017 International Conference on Electronic Industry and Automation (EIA 2017)

Design of Bias Power Supply for Magnetron Sputtering with Automatic Equalization Current

Authors
Xiping HUANG, Guitao CHEN, Yanlin NIE
Corresponding Author
Xiping HUANG
Available Online July 2017.
DOI
10.2991/eia-17.2017.43How to use a DOI?
Keywords
bias power supply for magnetron sputtering (BPSMS); combined full bridge; crossed rectification; automatic equalization current (AEC)
Abstract

High power switching power supply with modularization faces the challenges of equalizing voltage and current between each module. It is difficult to guarantee the reliable equalizing current by controlled equalizing current method while the large current is changing in the arc process of magnetron sputtering. A high power BPSMS based on the input parallel output parallel phase shifted full bridge converter (IPOP-PSFB) was developed. The power supply could realize AEC via the transformer secondary side crossed rectification without adding additional control strategy. The operating mode of the main circuit and the steady-state equalizing current principle were analyzed. Finally, a 20kW experimental prototype was designed to verify the effect of AEC.

Copyright
© 2017, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 2017 International Conference on Electronic Industry and Automation (EIA 2017)
Series
Advances in Intelligent Systems Research
Publication Date
July 2017
ISBN
10.2991/eia-17.2017.43
ISSN
1951-6851
DOI
10.2991/eia-17.2017.43How to use a DOI?
Copyright
© 2017, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

TY  - CONF
AU  - Xiping HUANG
AU  - Guitao CHEN
AU  - Yanlin NIE
PY  - 2017/07
DA  - 2017/07
TI  - Design of Bias Power Supply for Magnetron Sputtering with Automatic Equalization Current
BT  - Proceedings of the 2017 International Conference on Electronic Industry and Automation (EIA 2017)
PB  - Atlantis Press
SP  - 199
EP  - 203
SN  - 1951-6851
UR  - https://doi.org/10.2991/eia-17.2017.43
DO  - 10.2991/eia-17.2017.43
ID  - HUANG2017/07
ER  -