Mask Chemical Micromachining of Cylindrical Array Structures on Copper Substrates
Authors
Mingqian Gao, Jinlong Song, Yao Cui, Changlin Zhao
Corresponding Author
Mingqian Gao
Available Online April 2017.
- DOI
- 10.2991/fmsmt-17.2017.227How to use a DOI?
- Keywords
- Microarray, Photoresist, Chemical etching, Micro-machining.
- Abstract
The microarray structured surfaces in the nature, such as shark skin and lotus leaf, have good waterproof and anti-friction performances. Besides, the microarray structures above also have good application prospects in heat exchange and biomedicine. Compared to traditional machining with problems of high cost and low efficiency, the mask chemical etching method has the advantages that no residual stress exists when processing, and can be employed for large area preparation with high machining efficiency. We propose to prepare micro cylindrical array structures on copper substrate by mask chemical etching method, and research influences of processing parameters on the size of microarray structures.
- Copyright
- © 2017, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Mingqian Gao AU - Jinlong Song AU - Yao Cui AU - Changlin Zhao PY - 2017/04 DA - 2017/04 TI - Mask Chemical Micromachining of Cylindrical Array Structures on Copper Substrates BT - Proceedings of the 2017 5th International Conference on Frontiers of Manufacturing Science and Measuring Technology (FMSMT 2017) PB - Atlantis Press SP - 1158 EP - 1161 SN - 2352-5401 UR - https://doi.org/10.2991/fmsmt-17.2017.227 DO - 10.2991/fmsmt-17.2017.227 ID - Gao2017/04 ER -