Proceedings of the 5th International Conference on Advanced Design and Manufacturing Engineering

Characterizations of nickel oxide thin films prepared by reactive radio frequency magnetron sputtering

Authors
Z.H. Xiao, X.F. Xia, S.J. Xu, Y.P. Luo, W. Zhong, H. Ou, E.S. Jiang
Corresponding Author
Z.H. Xiao
Available Online October 2015.
DOI
https://doi.org/10.2991/icadme-15.2015.160How to use a DOI?
Keywords
Nickel Oxide; Magnetron Sputtering; Reactive Sputtering; Optical property; Electrical property
Abstract

The NiO thin films were preapred by reactive radio frequency magnetron sputtering method on glass substrates. The influence of sputtering power on the crystal structure, surface morphological, optical and electrical properties was investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), ultraviolet-visible spectrophotometer (UV-VIS) and Hall effect tester, respectively. The as-preapred NiO thin films are polycrystalline with preferred orientation growth along (200) plane and have very high optical trans-mittances more than 60 %. All samples have a columnar structure with growth perpendicular to the film sur-face, and are dense, and homogeneous. With the increase of the sputtering power, a growth mode transforma-tion appears from island growth to layer growth. The lowest resistivity of 2.4 •cm could be obtained in our samples. An optimization electrical properties of the films can be achieved by the variation of crystal quality arises from the sputtering power.

Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 5th International Conference on Advanced Design and Manufacturing Engineering
Series
Advances in Engineering Research
Publication Date
October 2015
ISBN
978-94-6252-113-1
ISSN
2352-5401
DOI
https://doi.org/10.2991/icadme-15.2015.160How to use a DOI?
Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

TY  - CONF
AU  - Z.H. Xiao
AU  - X.F. Xia
AU  - S.J. Xu
AU  - Y.P. Luo
AU  - W. Zhong
AU  - H. Ou
AU  - E.S. Jiang
PY  - 2015/10
DA  - 2015/10
TI  - Characterizations of nickel oxide thin films prepared by reactive radio frequency magnetron sputtering
BT  - Proceedings of the 5th International Conference on Advanced Design and Manufacturing Engineering
PB  - Atlantis Press
SP  - 827
EP  - 832
SN  - 2352-5401
UR  - https://doi.org/10.2991/icadme-15.2015.160
DO  - https://doi.org/10.2991/icadme-15.2015.160
ID  - Xiao2015/10
ER  -