Fabrication of nanostructure arrays induced by laser on Si wafers
Available Online October 2015.
- 10.2991/icadme-15.2015.266How to use a DOI?
- Semiconductors; Nanostructure Arrays; Laser processing; SEM morphology
This work reports a new method of producing nanostructure arrays on monocrystal Si wafers. During the course of electrochemical anodic etching in HF solution, nanostructure arrays formed on N-type Si wafers under laser illumination ( =650nm). A field emitting scanning electronic microscope (FESEM) was used to study the morphology of the samples and an X-ray energy dispersion spectroscope (EDS) was employed to analyze the components of the arrays. Effects of etching time and light sources on the morphology of nanostructure arrays obtained on polished and rough surface of silicon wafer are also studied. Moreover, the growth mechanism is proposed.
- © 2015, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Hua Zhang PY - 2015/10 DA - 2015/10 TI - Fabrication of nanostructure arrays induced by laser on Si wafers BT - Proceedings of the 5th International Conference on Advanced Design and Manufacturing Engineering PB - Atlantis Press SP - 1438 EP - 1442 SN - 2352-5401 UR - https://doi.org/10.2991/icadme-15.2015.266 DO - 10.2991/icadme-15.2015.266 ID - Zhang2015/10 ER -