Research on the chemical reaction in CF4 plasma during fused silica processing
Huiliang Jin, Nan Zheng, Wenhui Deng, Xianhua Chen
Available Online June 2017.
- https://doi.org/10.2991/icmia-17.2017.27How to use a DOI?
- APPJ, chemical reaction, F atoms, CF2 molecules.
- The chemical reaction involved in the processing of Atmospheric Pressure Plasma Jet (APPJ) produced from CF4 precursor has been explored. The gas-phase reaction in CF4 plasma and chemical reaction on SiO2 surface, which are the two crucial stages in plasma processing were investigated. The roles of gas-phase excited species, especially F atoms and CF2 molecules, were examined as they contribute to substrate etching and fluorocarbon film formation. Moreover, the relative concentrations of excited state species of F atoms and CF2 were acquired for CF4 plasma. The densities of F atoms increased dramatically with increasing applied RF power, whereas CF2 molecules decreased monotonically over the same power range. The spectrum of the F atoms and CF2 molecules fallowed the same tendency with the increasing concentration of gas CF4, and then the emission intensity of reactive atoms decreased with more CF4 molecules participating. Addition certain amount O2 into CF4 plasma resulted in promoting CF4 dissociation, O2 can easily react with the dissociation product of CF2 molecules, which inhibit the compound of the F atoms, and with the increasing concentration of O2.
- Open Access
- This is an open access article distributed under the CC BY-NC license.
Cite this article
TY - CONF AU - Huiliang Jin AU - Nan Zheng AU - Wenhui Deng AU - Xianhua Chen PY - 2017/06 DA - 2017/06 TI - Research on the chemical reaction in CF4 plasma during fused silica processing BT - 2017 6th International Conference on Measurement, Instrumentation and Automation (ICMIA 2017) PB - Atlantis Press SN - 1951-6851 UR - https://doi.org/10.2991/icmia-17.2017.27 DO - https://doi.org/10.2991/icmia-17.2017.27 ID - Jin2017/06 ER -