The effect of the substrate bias on structure and friction coefficient of tetrahedral amorphous carbon films deposited by filtered cathodic vacuum arc
Liang Han, Wei Yang, Bin Cui
Available Online June 2017.
- https://doi.org/10.2991/icmia-17.2017.107How to use a DOI?
- Tetrahedral amorphous carbon film; substrate bias; friction coefficient
- Tetrahedral amorphous carbon ( ta-C) films were deposited with filtered cathodic vacuum arc by changing the substrate bias from 0V to 500V. The fraction of the sp3 bonding will be effected by the substrate bias, and the sp3 fraction is about 85% when the substrate bias is -200V. The RMS of the films decreases with the increment of the substrate bias,the surface of the film deposited at the substrate bias -200V is smoothest, and the RMS is about 0.18 nm.When the substrate bias is 0V, the friction coefficient is the highest and the antiwear ability is poor; when the substrate bias is increased from 0V, the friction coefficient decreases with the increment of the substrate bias and the antiwear ability of the films is improved because of the lower RMS and the self- Lubrication.
- Open Access
- This is an open access article distributed under the CC BY-NC license.
Cite this article
TY - CONF AU - Liang Han AU - Wei Yang AU - Bin Cui PY - 2017/06 DA - 2017/06 TI - The effect of the substrate bias on structure and friction coefficient of tetrahedral amorphous carbon films deposited by filtered cathodic vacuum arc BT - 2017 6th International Conference on Measurement, Instrumentation and Automation (ICMIA 2017) PB - Atlantis Press SN - 1951-6851 UR - https://doi.org/10.2991/icmia-17.2017.107 DO - https://doi.org/10.2991/icmia-17.2017.107 ID - Han2017/06 ER -