Proceedings of the 2018 3rd International Workshop on Materials Engineering and Computer Sciences (IWMECS 2018)

Study on Availability of Damping Device Design of A Photoetching Machine

Authors
Qiguang Ke
Corresponding Author
Qiguang Ke
Available Online April 2018.
DOI
https://doi.org/10.2991/iwmecs-18.2018.124How to use a DOI?
Keywords
Photoetching machine, Device, Study
Abstract
The basal plate is key component of thin film transistor(TFT), which is mainly used to load bearing processed liquid crystal plate. To decrease the effect of ground shaking, the basal plate is usually fixed on the inner frame supported by the damping device. In this case, in addition to quarantine ground base, the damping device must quickly decrease the vibration caused by horizontal movement reaction force of the basal plate, and compensate the position fluctuation of the bumper caused by change of gravity center when the basal plate moves. With the continuous increase of the size of liquid crystal plate, the basal plate, quality and speed also continuously go up and the reaction force is also stronger and stronger that is reacted onto the inner framework, thus the requirements for the bumper become more and more serious.
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Proceedings
2018 3rd International Workshop on Materials Engineering and Computer Sciences (IWMECS 2018)
Part of series
Advances in Computer Science Research
Publication Date
April 2018
ISBN
978-94-6252-491-0
ISSN
2352-538X
DOI
https://doi.org/10.2991/iwmecs-18.2018.124How to use a DOI?
Open Access
This is an open access article distributed under the CC BY-NC license.

Cite this article

TY  - CONF
AU  - Qiguang Ke
PY  - 2018/04
DA  - 2018/04
TI  - Study on Availability of Damping Device Design of A Photoetching Machine
BT  - 2018 3rd International Workshop on Materials Engineering and Computer Sciences (IWMECS 2018)
PB  - Atlantis Press
SN  - 2352-538X
UR  - https://doi.org/10.2991/iwmecs-18.2018.124
DO  - https://doi.org/10.2991/iwmecs-18.2018.124
ID  - Ke2018/04
ER  -