Microfluidic Chips Etching Process on Soda-lime Glass

DOI

10.2991/mems.2012.81How to use a DOI?

Keywords

microfluidic chips; soda-lime glass; etching

Abstract

The process to manufacture microfluidic chip using quartz glass or Pyrex 7740 glass is expensive and complex. In order to overcome these, save production costs, simplify the process, and shorten the production cycle, soda-lime glass was designed as substrate carrier; positive photoresist AZ 4620 was designed as mask layer, to make the microfluidic chip production process efficient, rapid, and low-cost. Some key technique, such as thickness of photoresist, various stages of baking parameters, exposure and developer volume, etching environment and the glass buffered oxide etching (BOE) ratio had been solved. The adhesion of the photoresist with the glass, and photoresist’s tolerance time in BOE had been solved as well. With the optimized process, the etching depth can achieve 80 m, the minimum feature size could be less than 50 m, the sidewall steepness is less than 100°, the flatness error is less than ± 1.5 m, and the production cycle is only 4 hour.

Copyright

© 2012, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Wang Guanglong
AU  - Li Qichang
AU  - Dong Yu
AU  - Chen Jianhui
AU  - Gao Fengqi
AU  - Zhang Shanshan
PY  - 2012/12
DA  - 2012/12
TI  - Microfluidic Chips Etching Process on Soda-lime Glass
BT  - Proceedings of the 1st International Conference on Mechanical Engineering and Material Science (MEMS 2012)
PB  - Atlantis Press
SP  - 306
EP  - 309
SN  - 1951-6851
UR  - https://doi.org/10.2991/mems.2012.81
DO  - 10.2991/mems.2012.81
ID  - Guanglong2012/12
ER  -