Sequential and Tonal Markedness in Zijin Hakka Tone Sandhi

DOI

10.2991/hssmee-18.2018.73How to use a DOI?

Keywords

Hakka, tone sandhi, rule-based model, Bao’s tonal geometry model, Optimality Theory.

Abstract

This paper examines two complex tone sandhi patterns in Zijin Hakka by using rule-based generative model, and Optimality Theory. The first sandhi pattern involves both assimilation and dissimilation processes. Assimilation forces adjacent tone contour features to agree, while dissimilation forces adjacent elements to be different at the contour level. These tonal alternations are captured by constraints OCP-c(lh), IDENT-IO-t-L, *peak pitch and Align last contour right. The second sandhi rule has neutralization process. When the rising tones followed by falling tone in Zijin Hakka, the whole two adjacent syllables will neutralize to 13-351. This fact is captured by constraint *lh.hl, F, IDENT-IO-t-L, *peak pitch, Align last contour right and F(#lh.).

Copyright

© 2018, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Jingyi Chen
PY  - 2018/09
DA  - 2018/09
TI  - Sequential and Tonal Markedness in Zijin Hakka Tone Sandhi
BT  - Proceedings of the 2018 International Symposium on Humanities and Social Sciences, Management and Education Engineering (HSSMEE 2018)
PB  - Atlantis Press
SP  - 428
EP  - 443
SN  - 2352-5398
UR  - https://doi.org/10.2991/hssmee-18.2018.73
DO  - 10.2991/hssmee-18.2018.73
ID  - Chen2018/09
ER  -