Preparation and Characterization of Electrodeposited Aluminum Oxide Thin Films

DOI

10.2991/icacsei.2013.127How to use a DOI?

Keywords

Aluminum oxide, Electrodeposition, XRD, SEM, grain size.

Abstract

Aluminum Oxide (Al2O3) deposition is being sought for application in space / aerospace as a barrier coating. Al2O3 not only changes the mechanical properties of the aluminum based alloys, it acts as a barrier for harmful radiations. Ionizing radiations are harmful to electronic components, which runaway due to extra charge carriers being produced, used in the space vehicles. We are employing electro-deposition along with sol-gel deposition in order to produce these coatings. Both of the techniques are simple, cheap and scalable. The prepared films are characterized by Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and X-Ray Diffraction (XRD) for their structural / microstructural properties. In this paper, these properties are correlated to the deposition conditions in order to optimize the conditions for the applications mentioned above. The initial results being presented here are very encouraging regarding the smoothness of the films and the grain / particle size achieved so far.

Copyright

© 2013, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Farzana Majid
AU  - Saira Riaz
AU  - Muhammad I. Akram
AU  - Shahid Atiq
AU  - Shahzad Naseem
PY  - 2013/08
DA  - 2013/08
TI  - Preparation and Characterization of Electrodeposited Aluminum Oxide Thin Films
BT  - Proceedings of the 2013 International Conference on Advanced Computer Science and Electronics Information (ICACSEI 2013)
PB  - Atlantis Press
SP  - 523
EP  - 526
SN  - 1951-6851
UR  - https://doi.org/10.2991/icacsei.2013.127
DO  - 10.2991/icacsei.2013.127
ID  - Majid2013/08
ER  -