Proceedings of the 2017 International Conference on Manufacturing Engineering and Intelligent Materials (ICMEIM 2017)

Influence of Voltage on Electrolysis and Plasma Polishing

Authors
Ji Wang, Xue-mei Zong, Jian-fei Liu, Sen Feng
Corresponding Author
Ji Wang
Available Online February 2017.
DOI
https://doi.org/10.2991/icmeim-17.2017.3How to use a DOI?
Keywords
Electrolysis and Plasma, Voltage, Material Removal Rate, Roughness, Electrical Power.
Abstract
Influence of voltage on material removal rate, surface roughness and power consumption were experimentally studied in this paper. Different polishing states were analyzed from standpoint of electricity transition on the basis of the polishing mechanism. The reason that material removal rate, surface roughness and electricity cost influenced by voltage was given. The experiments show that, material removal rate gradually decrease and velocity of surface roughness reduction gradually slow with increase of voltage. When voltage is at a range of 270-330V, the minimum of surface roughness that polishing can reach is the minimum; when voltage is 270-290V, electrical power reaches the minimum.
Open Access
This is an open access article distributed under the CC BY-NC license.

Download article (PDF)

Proceedings
2017 International Conference on Manufacturing Engineering and Intelligent Materials (ICMEIM 2017)
Part of series
Advances in Engineering Research
Publication Date
February 2017
ISBN
978-94-6252-317-3
ISSN
2352-5401
DOI
https://doi.org/10.2991/icmeim-17.2017.3How to use a DOI?
Open Access
This is an open access article distributed under the CC BY-NC license.

Cite this article

TY  - CONF
AU  - Ji Wang
AU  - Xue-mei Zong
AU  - Jian-fei Liu
AU  - Sen Feng
PY  - 2017/02
DA  - 2017/02
TI  - Influence of Voltage on Electrolysis and Plasma Polishing
BT  - 2017 International Conference on Manufacturing Engineering and Intelligent Materials (ICMEIM 2017)
PB  - Atlantis Press
SN  - 2352-5401
UR  - https://doi.org/10.2991/icmeim-17.2017.3
DO  - https://doi.org/10.2991/icmeim-17.2017.3
ID  - Wang2017/02
ER  -