Planar Near-field Scanner System Error Analysis
Authors
Chao Tu, Jun Liu, Yinghui Hu
Corresponding Author
Chao Tu
Available Online December 2015.
- DOI
- 10.2991/icmmcce-15.2015.155How to use a DOI?
- Keywords
- planar near field; gantry; error analysis
- Abstract
Planar near-field measurement technology is an emerging technology for near-field antenna measurement. It has been widely used in foreign countries. In recent years, domestic develop faster and faster. Gantry motion platform positioning technology is one of planar near field measurement technology key technologies. It has a direct impact on the measurement accuracy. To achieve high-precision planar near field measurement, the most important is high precision scanning system. This paper analyzes the sources of error and error magnitude of planar near-field scanner system.
- Copyright
- © 2015, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Chao Tu AU - Jun Liu AU - Yinghui Hu PY - 2015/12 DA - 2015/12 TI - Planar Near-field Scanner System Error Analysis BT - Proceedings of the 4th International Conference on Mechatronics, Materials, Chemistry and Computer Engineering 2015 PB - Atlantis Press SP - 774 EP - 777 SN - 2352-538X UR - https://doi.org/10.2991/icmmcce-15.2015.155 DO - 10.2991/icmmcce-15.2015.155 ID - Tu2015/12 ER -