Effects of Dimethyl Formamide on Laser-induced Damage to SiO2 Films Prepared by the Sol-gel Method

DOI

10.2991/icmsa-15.2015.59How to use a DOI?

Keywords

SiO2 Films, Dimethyl Formamide (DMF), Laser-induced Damage Threshold (LIDT), Morphology.

Abstract

Monolayer SiO2 films with various dimethyl formamide (DMF) concentrations were prepared on BK7 glass by the sol–gel method. The refractive index and physical thickness of the SiO2 films were calculated using the transmission spectra of the samples. Laser-induced damage threshold (LIDT) results showed that the LIDTs of the SiO2 films increased with increasing DMF concentration. Differences in LIDT were induced by the SiO2 microstructure and differences in porous ratio attributed to variations in DMF concentration. Addition of DMF can improve film pore structures, produce uniform silica particles, improve the stress distribution within films, and generate porous structures that provide more space for stress relaxation during laser radiation. The damage morphology of the SiO2 film was typically caused by defects.

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Pei-Tao Guo
AU  - Yu-Hong Man
AU  - Yong-Ping Zhang
PY  - 2014/06
DA  - 2014/06
TI  - Effects of Dimethyl Formamide on Laser-induced Damage to SiO2 Films Prepared by the Sol-gel Method
BT  - Proceedings of the 2015 International Conference on Material Science and Applications
PB  - Atlantis Press
SP  - 319
EP  - 323
SN  - 2352-541X
UR  - https://doi.org/10.2991/icmsa-15.2015.59
DO  - 10.2991/icmsa-15.2015.59
ID  - Guo2014/06
ER  -