Proceedings of the 2015 International Conference on Material Science and Applications

Effect of Sputtering Power on Nano-mechanical Properties of SiCO Film

Authors
Chun-Yang Liu, Ning-Bo Liao, Yao Yang, Jie-Lin Zhang
Corresponding Author
Chun-Yang Liu
Available Online June 2014.
DOI
https://doi.org/10.2991/icmsa-15.2015.192How to use a DOI?
Keywords
SiCO, Magnetron Sputtering, Scratch Test, Nano-indentation.
Abstract
In this study, unbalanced magnetron sputtering approach was used to prepare SiC film by using high-purity Si target. SiCO films were synthesized by reactive radio-frequency sputtering from a SiC target with oxygen gas. Nano-indentation and scratch test were used to study the mechanical properties of SiCO film at different sputtering power. According to the experimental results, optimums of Young’s modulus, surface roughness and adhesion strength present at an optimal sputtering power.
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Proceedings
2015 International Conference on Material Science and Applications (icmsa-15)
Part of series
Advances in Physics Research
Publication Date
June 2014
ISBN
978-94-62520-75-2
ISSN
2352-541X
DOI
https://doi.org/10.2991/icmsa-15.2015.192How to use a DOI?
Open Access
This is an open access article distributed under the CC BY-NC license.

Cite this article

TY  - CONF
AU  - Chun-Yang Liu
AU  - Ning-Bo Liao
AU  - Yao Yang
AU  - Jie-Lin Zhang
PY  - 2014/06
DA  - 2014/06
TI  - Effect of Sputtering Power on Nano-mechanical Properties of SiCO Film
BT  - 2015 International Conference on Material Science and Applications (icmsa-15)
PB  - Atlantis Press
SP  - 1037
EP  - 1041
SN  - 2352-541X
UR  - https://doi.org/10.2991/icmsa-15.2015.192
DO  - https://doi.org/10.2991/icmsa-15.2015.192
ID  - Liu2014/06
ER  -