Effect of Sputtering Power on Nano-mechanical Properties of SiCO Film

DOI

10.2991/icmsa-15.2015.192How to use a DOI?

Keywords

SiCO, Magnetron Sputtering, Scratch Test, Nano-indentation.

Abstract

In this study, unbalanced magnetron sputtering approach was used to prepare SiC film by using high-purity Si target. SiCO films were synthesized by reactive radio-frequency sputtering from a SiC target with oxygen gas. Nano-indentation and scratch test were used to study the mechanical properties of SiCO film at different sputtering power. According to the experimental results, optimums of Young’s modulus, surface roughness and adhesion strength present at an optimal sputtering power.

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Chun-Yang Liu
AU  - Ning-Bo Liao
AU  - Yao Yang
AU  - Jie-Lin Zhang
PY  - 2014/06
DA  - 2014/06
TI  - Effect of Sputtering Power on Nano-mechanical Properties of SiCO Film
BT  - Proceedings of the 2015 International Conference on Material Science and Applications
PB  - Atlantis Press
SP  - 1037
EP  - 1041
SN  - 2352-541X
UR  - https://doi.org/10.2991/icmsa-15.2015.192
DO  - 10.2991/icmsa-15.2015.192
ID  - Liu2014/06
ER  -