Effect of Sputtering Power on Nano-mechanical Properties of SiCO Film
Chun-Yang Liu, Ning-Bo Liao, Yao Yang, Jie-Lin Zhang
Available Online June 2014.
- https://doi.org/10.2991/icmsa-15.2015.192How to use a DOI?
- SiCO, Magnetron Sputtering, Scratch Test, Nano-indentation.
- In this study, unbalanced magnetron sputtering approach was used to prepare SiC film by using high-purity Si target. SiCO films were synthesized by reactive radio-frequency sputtering from a SiC target with oxygen gas. Nano-indentation and scratch test were used to study the mechanical properties of SiCO film at different sputtering power. According to the experimental results, optimums of Young’s modulus, surface roughness and adhesion strength present at an optimal sputtering power.
- Open Access
- This is an open access article distributed under the CC BY-NC license.
Cite this article
TY - CONF AU - Chun-Yang Liu AU - Ning-Bo Liao AU - Yao Yang AU - Jie-Lin Zhang PY - 2014/06 DA - 2014/06 TI - Effect of Sputtering Power on Nano-mechanical Properties of SiCO Film BT - 2015 International Conference on Material Science and Applications (icmsa-15) PB - Atlantis Press SP - 1037 EP - 1041 SN - 2352-541X UR - https://doi.org/10.2991/icmsa-15.2015.192 DO - https://doi.org/10.2991/icmsa-15.2015.192 ID - Liu2014/06 ER -