Photolithography technology in electronic fabrication

DOI

10.2991/ipemec-15.2015.156How to use a DOI?

Keywords

photolithography; photomask; EUV(12nm)

Abstract

The paper introduce the photolithography technology. First, the writer explain the process of photolithography. a modern wafer (form IC) will go through a photolithography cycle up to 50 times, some 100 times more. then, the article illustrate photoresist , photoresists are classified two groups :positive resist and negative resist. another important technology is photomask, it is the mass production of IC device,worldwide photomask market was estimated as 3.2 billion in 2012.at the last ,the paper introduce the photolithography machine(tools). the newest feature size of photolithography machine will bring us to 12nm time, maybe 2016.

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - XiaoMing Hu
PY  - 2015/05
DA  - 2015/05
TI  - Photolithography technology in electronic fabrication
BT  - Proceedings of the 2015 International Power, Electronics and Materials Engineering Conference
PB  - Atlantis Press
SP  - 843
EP  - 850
SN  - 2352-5401
UR  - https://doi.org/10.2991/ipemec-15.2015.156
DO  - 10.2991/ipemec-15.2015.156
ID  - Hu2015/05
ER  -