Microstructure Formation and Toughening Effect of TiAl Based Microlaminate Sheet Deposited by Electron Beam
- DOI
- 10.2991/nceece-15.2016.160How to use a DOI?
- Keywords
- EBPVD; Microstructure;Toughening;TiAl intermetallic; Mechanical properties
- Abstract
A free-standing TiAl based microlaminate sheet with thickness of 300 m was deposited with high-power electron beam physical vapour deposition system. Microstructure and phase analysis of as-deposited samples were studied by XRD, SEM and TEM. Toughening by structure was analyzed with tensile test. The results show as-deposited sample was constituted of 2-Ti3Al and -TiAl and -Ti. Alternation of rich aluminum zone and rich titanium zone are presented along cross section of TiAl depositing layer resulted from deviation of saturated vapor pressure between aluminum and titanium. After densification treatment, room-temperature tensile strength and elongation increased compared to that of as-deposited samples reached 657 MPa and 2.95%, respectively. Tensile strength under high temperature exhibits an abnormal increase, exceeding 450 MPa at 1023K. The presence of ductile Ti layers can lead to cracks stagger along inter-laminar interfaces or crack deflection and the micro-bridge connection caused by ductile Ti layers, due to the TiAl-Ti3Al/ -Ti micro-laminate displaying a fine characteristic of delayed fracture.
- Copyright
- © 2016, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Lu-ju He AU - Li Ma AU - Xian-yi Shao PY - 2015/12 DA - 2015/12 TI - Microstructure Formation and Toughening Effect of TiAl Based Microlaminate Sheet Deposited by Electron Beam BT - Proceedings of the 2015 4th National Conference on Electrical, Electronics and Computer Engineering PB - Atlantis Press SP - 880 EP - 885 SN - 2352-5401 UR - https://doi.org/10.2991/nceece-15.2016.160 DO - 10.2991/nceece-15.2016.160 ID - He2015/12 ER -