Cultural Industry System Innovation and Cultural Industry Development: Based on the Comparison of Beijing, Shanghai and Shenzhen
- DOI
- 10.2991/assehr.k.200801.058How to use a DOI?
- Keywords
- Cultural industry, System innovation, Comparison, Scientific and Technological innovation
- Abstract
The actively innovation of cultural industry system brings about the good status of cultural industry’s development. In Beijing, Shanghai and Shenzhen, a large number of cultural industry giants are clustering, which is due to the innovation of cultural industry system. As for the proportion of technological innovation policy, Shenzhen (0.80) has the advantage of technological innovation in sum, which is higher than Beijing (0.67) and Shanghai (0.56). The rangeability of government subsidy policy in Shanghai is greater than Beijing and Shenzhen. From the perspective of the proportion of supportive policies of cultural enterprises, Beijing (0.07) had made a lot of policies which more than Shanghai’s (0.05) and Shenzhen’s (0.03). Compared with the innovation competence of cultural industry system, Shanghai’s innovation competence index (18.02) is higher than Beijing’s (16.04) and Shenzhen’s (13.77). In view of this, achieving the intimately interaction between cultural industry system innovation and cultural industry development environment will be the key factor for the innovation of cultural industry system in the future.
- Copyright
- © 2020, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Shanglin Si AU - Xuefang Xie AU - Qinliang Liu PY - 2020 DA - 2020/08/01 TI - Cultural Industry System Innovation and Cultural Industry Development: Based on the Comparison of Beijing, Shanghai and Shenzhen BT - Proceedings of the 2020 International Conference on Social Science, Economics and Education Research (SSEER 2020) PB - Atlantis Press SP - 240 EP - 243 SN - 2352-5398 UR - https://doi.org/10.2991/assehr.k.200801.058 DO - 10.2991/assehr.k.200801.058 ID - Si2020 ER -